HIP IMPLANT DURING VCN PROCESS

Cleaning of Hip Implants

 

 

 

 

 

 

Hip implants were cleaned in the VCN process using off the self hydrogen peroxide concentrations of 3%. The results were acceptable implants well within the required levels for bio burden, toxicity and total carbon.

PART #1 PART #2 PART #3 ACCEPTABLE LEVELS
BIOBURDEN 8 16 30 <100, PREFERABLY <50
TOXICITY Non Toxic (grade 0) Non Toxic (grade 0) Non Toxic (grade 0) GRADE 2, MILDLY TOXIC BEFORE CLEANING CLCLE
TOTAL CARBON 191 282 248 <1500 NORMALLY TEST AT 100/500

YOUTUBE VIDEO: MEDICAL PARTS CLEANER THAT CLEANS INTERNAL SURFACES: The video shows vapor bubble formation within an internal porous matrix. The porous part behaves like a sponge during the pulsing VCN process. Fluid is expelled from the part during the vacuum cycle as when squeezing a sponge and then the pores are filled with fresh fluid during the pressure cycle as when a sponge is submerged in a fluid.