HIP IMPLANT DURING VCN PROCESS
Cleaning of Hip Implants
Hip implants were cleaned in the VCN process using off the self hydrogen peroxide concentrations of 3%. The results were acceptable implants well within the required levels for bio burden, toxicity and total carbon.
|PART #1||PART #2||PART #3||ACCEPTABLE LEVELS|
|BIOBURDEN||8||16||30||<100, PREFERABLY <50|
|TOXICITY||GRADE 2, MILDLY TOXIC BEFORE CLEANING
|TOTAL CARBON||191||282||248||<1500 NORMALLY TEST AT 100/500|
YOUTUBE VIDEO: MEDICAL PARTS CLEANER THAT CLEANS INTERNAL SURFACES: The video shows vapor bubble formation within an internal porous matrix. The porous part behaves like a sponge during the pulsing VCN process. Fluid is expelled from the part during the vacuum cycle as when squeezing a sponge and then the pores are filled with fresh fluid during the pressure cycle as when a sponge is submerged in a fluid.